1. Overview
The System can accommodate a wide range of materials and process from odd sized substrates,
Piece to 4¡± with UV or Deep UV Exposure. The MDA-400M is being successfully used in the Manufacturing
of Semiconductors, Opto Electronics, Flat Panel, RF Microwave, Diffractive Optics, Mems, Bump, or Flip
chip devices and other Technologies requiring fine geometry printing & precision Alignment.
2. Module
Mask Aligner & UV Source Module : 1 qty
Exposure system Wafer stage Module : 1 qty
Microscope with CCD camera : 1 set
Monitor : 1 qty
Mask Holder : 1 qty
Sample chuck : 1 qty
UV lamp power supply : 1 qty
350W UV Lamp : 1 qty
Controller : 1 qty
Oil-less Vacuum Pump : 1 qty
3. Specification
¡Ü Standard Feature
¢Å Wafer stage
Substrate Size : Up to 4¡±
Chuck size : Piece ~ 4¡±
Movement X : ¡¾5 mm Y : ¡¾5 mm Z : 10 mm ¥È : ¡¾3¡Æ
Alignment accuracy : < ¡¾1 um
Wafer to mask level : Air bearing type wedge compensation
X, Y, ¥È , Z-Axis Moving : Manual micrometer
Vacuum : Oil-less Vacuum Pump
¢Å Mask stage
Mask size : Up to 7 inch
Mask holding type : Vacuum & * clip
Proximity Gap : Z-Axis micrometer ( Resolution 0.5 um )
¢Å UV source
UV lamp : 350 W
Uniform beam size : 4.25¡° X 4.25¡°
Exposure mode : Pressure ( Hard, Soft ) / Vacuum / Proximity
Exposure time control : Changeable
Exposure timer : 1 ~ 999.9 sec
Beam Intensity : 365nm Max. Intensity : 30 mw/cm2
Wavelength : NUV 350nm ~ 450nm
Beam Uniformity : ¡Â ¡¾3%
¢Å Microscope
Type : Dual CCD zoom Microscope
Monitor : 17¡± LCD Monitor
Video mode : Single and split field
Magnification : 80x ~ 1,000x
Focus : Manual
Objective spacing : Variable (60mm ~ 100mm)
Working distance : 86 mm / 32 mm
Field of View : 6,9 mm ~ 0.03 mm
Depth of Field : 2.98 mm ~ 0.03 mm
¢Å Control system
Manual Controller
¢Å Mask ( User Spec )
Pattern shape : User Spec
Mask thickness : User Spec
Size : up to 7¡± Mask
¢Å Resolution
Vacuum Contact :1 um ( Thin PR@Si Wafer )
Hard Contact : 2 um
Soft contact : 3 um
20 um Proximity : 5um
¢Å Lamp
Uniformity : 5 ~ 9 Point Standard
Idle Power: ~ 300 W
Power Mode: CP (Constant Power) & CI (Constant Intensity)
4. Utility
1)Dimension(mm) : 1000mm*950mm*800mm [W*D*H]
2)Electric Power : 220V, 20Amp, 50/60Hz, 1 Phase
3)N2 : More than 3kg/cm2 ( 40 psi ), Flow rate 5 Liter/min, Out side diameter 6 mm Tube
4)Air: More than 5kg/cm2 ( 80 psi ), Flow rate 10 Liter/min, Out side diameter 6 mm Tube
5)Vacuum: ¡Ã 600mmHg, ( Vacuum pump include )
6)Weight : Equipment : 200 kg / (With Packing : 300 kg)
